Sputtering Targets |
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We have three technologies to produce the targets.
1) vacuum furnace to melt the metals, such as NiCr, NiAl, NiCu and NiV targets.
2) powder metallurgy method by HIP/CIP, such as Cr targets.
3) plasma spraying, such as SiAl targets.
We could supply both planar targets and rotary targets.
We mainly supply targets for the industry of LOW-E glass, FPD, Tooling and Solar, etc.
For Low-E glass industry, we supply rotary SiAl, TiOx, SnZn, ZnAl, Sn, Cr, Si and stainless steel 316L and planar NiCr, Cr targets.
For FPD industry, we mainly supply planar Mo, Nb, Ti and Al targets and rotary Nb targets.
For solar industry, we mainly supply planar AZO, Mo, NiCu, NiAl, NiCr, NiV and Al targets and rotary AZO and Mo targets.
For tooling industry, we mainly supply TiAl by HIP and TiAl by melting method and Cr targets.
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| TiAl Target |
TiAlSi Target |
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| Co Based Target |
TiAl Target |
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